Radio Frequency Sputtering

Thin-Film Deposition and Device Applications

Edited by Aditya Sharma Edited by Weon Cheol Lim Edited by Poorva Sharma Edited by Jitendra Pal Singh

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Extent: 432 pages

Publisher: Wiley-VCH

Language: English

Hardback (Forthcoming)

(November 2026)

ISBN: 9783527356225

6.69 x 9.61 inches

Price: $199.00

The book covers the fundamentals and advanced techniques of radiofrequency sputtering, including process optimization, troubleshooting, and sustainability practices. It provides a comprehensive overview of the technique, its applications in various industries, and practical guidance for researchers and engineers. It focuses on established and emerging applications and thus is a must-have reference for researchers in academia and developers in industry.

Part 1: Phenomena
1. Mechanistic Understanding of Sputtering
2. Advancement in Sputtering Experimental Set-Up
3. Hybrid Sputtering Systems
4. Phenomenological Understanding of Film Growth by Sputtering
5. Atomic-Scale Understanding of Sputtering-Assisted Film Growth by X-Ray Absorption
 
Part 2: Film Growth Examples
6. Epitaxial Growth via Radio Frequency Sputtering Process
7. Deposition of Layers for Solar Cells
8. Sputtering-Assisted Growth of Magnetic Thin Films
9. Sputtering for Growth of Oxides from Metal Targets
 
Part 3: Types of Sputtering
10. Ion Beam Sputtering
11. High Power Pulsed Magnetron Sputtering
12. Reactive Magnetron Sputtering
 
Part 4: Industrial Applications
13. Sputtering for Development of Magnetic Tunnel Junctions
14. Deposition of Thin Films for AMR Devices
15. Sputtering for Thin Film Batteries
16. Sputtering for Semiconductor Devices

  • Edited by Aditya Sharma
  • Edited by Weon Cheol Lim
  • Edited by Poorva Sharma
  • Edited by Jitendra Pal Singh