Radio Frequency Sputtering
Thin-Film Deposition and Device Applications
Edited by Aditya Sharma Edited by Weon Cheol Lim Edited by Poorva Sharma Edited by Jitendra Pal Singh
Hardback (Forthcoming)
(November 2026)
ISBN: 9783527356225
6.69 x 9.61 inches
Price: $199.00
The book covers the fundamentals and advanced techniques of radiofrequency sputtering, including process optimization, troubleshooting, and sustainability practices. It provides a comprehensive overview of the technique, its applications in various industries, and practical guidance for researchers and engineers. It focuses on established and emerging applications and thus is a must-have reference for researchers in academia and developers in industry.
Part 1: Phenomena
1. Mechanistic Understanding of Sputtering
2. Advancement in Sputtering Experimental Set-Up
3. Hybrid Sputtering Systems
4. Phenomenological Understanding of Film Growth by Sputtering
5. Atomic-Scale Understanding of Sputtering-Assisted Film Growth by X-Ray Absorption
Part 2: Film Growth Examples
6. Epitaxial Growth via Radio Frequency Sputtering Process
7. Deposition of Layers for Solar Cells
8. Sputtering-Assisted Growth of Magnetic Thin Films
9. Sputtering for Growth of Oxides from Metal Targets
Part 3: Types of Sputtering
10. Ion Beam Sputtering
11. High Power Pulsed Magnetron Sputtering
12. Reactive Magnetron Sputtering
Part 4: Industrial Applications
13. Sputtering for Development of Magnetic Tunnel Junctions
14. Deposition of Thin Films for AMR Devices
15. Sputtering for Thin Film Batteries
16. Sputtering for Semiconductor Devices
- Edited by Aditya Sharma
- Edited by Weon Cheol Lim
- Edited by Poorva Sharma
- Edited by Jitendra Pal Singh
